JPS6325658B2 - - Google Patents

Info

Publication number
JPS6325658B2
JPS6325658B2 JP60049247A JP4924785A JPS6325658B2 JP S6325658 B2 JPS6325658 B2 JP S6325658B2 JP 60049247 A JP60049247 A JP 60049247A JP 4924785 A JP4924785 A JP 4924785A JP S6325658 B2 JPS6325658 B2 JP S6325658B2
Authority
JP
Japan
Prior art keywords
film
refractive index
polymer
light
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP60049247A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61209449A (ja
Inventor
Tsumoru Kuwabara
Yasunori Fukumitsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd filed Critical Asahi Chemical Industry Co Ltd
Priority to JP60049247A priority Critical patent/JPS61209449A/ja
Publication of JPS61209449A publication Critical patent/JPS61209449A/ja
Publication of JPS6325658B2 publication Critical patent/JPS6325658B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Laminated Bodies (AREA)
JP60049247A 1985-03-14 1985-03-14 非反射性ペリクル体 Granted JPS61209449A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60049247A JPS61209449A (ja) 1985-03-14 1985-03-14 非反射性ペリクル体

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60049247A JPS61209449A (ja) 1985-03-14 1985-03-14 非反射性ペリクル体

Publications (2)

Publication Number Publication Date
JPS61209449A JPS61209449A (ja) 1986-09-17
JPS6325658B2 true JPS6325658B2 (en]) 1988-05-26

Family

ID=12825521

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60049247A Granted JPS61209449A (ja) 1985-03-14 1985-03-14 非反射性ペリクル体

Country Status (1)

Country Link
JP (1) JPS61209449A (en])

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0235849U (en]) * 1988-09-01 1990-03-08
JPH02125469U (en]) * 1989-03-27 1990-10-16

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63138352A (ja) * 1986-11-29 1988-06-10 Dainippon Printing Co Ltd ペリクル用高分子薄膜
JP2642637B2 (ja) * 1987-08-18 1997-08-20 三井石油化学工業 株式会社 防塵膜
JP2733483B2 (ja) * 1988-12-13 1998-03-30 三井化学株式会社 高光線透過性防塵体の製造方法
CA2005096C (en) * 1988-12-13 1999-03-23 Tokinori Agou High light-transmissive dust-proof body and method of preparing same
ATE122477T1 (de) * 1989-09-06 1995-05-15 Du Pont Nichtreflektierende filmabdeckung.
US5168001A (en) * 1991-05-20 1992-12-01 E. I. Du Pont De Nemours And Company Perfluoropolymer coated pellicle
US6342292B1 (en) 1997-12-16 2002-01-29 Asahi Kasei Kabushiki Kaisha Organic thin film and process for producing the same
US6926952B1 (en) 1998-01-13 2005-08-09 3M Innovative Properties Company Anti-reflective polymer constructions and method for producing same
US7416820B2 (en) * 2007-01-31 2008-08-26 International Business Machines Corporation Pellicle film optimized for immersion lithography systems with NA>1

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5546301A (en) * 1978-09-22 1980-04-01 Sandosutoroomu Pooru Toy gun
US4453828A (en) * 1981-12-02 1984-06-12 Advanced Semiconductor Products, Inc. Apparatus and methods for measuring the optical thickness and index of refraction of thin, optical membranes

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0235849U (en]) * 1988-09-01 1990-03-08
JPH02125469U (en]) * 1989-03-27 1990-10-16

Also Published As

Publication number Publication date
JPS61209449A (ja) 1986-09-17

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees